TMEC – NECTEC : National Electronics and Computer Technology Center https://www.nectec.or.th/en ศูนย์เทคโนโลยีอิเล็กทรอนิกส์และคอมพิวเตอร์แห่งชาติ Tue, 12 Jul 2022 06:17:56 +0000 en-US hourly 1 https://wordpress.org/?v=6.8.3 https://www.nectec.or.th/en/wp-content/uploads/2019/03/favicon.ico  TMEC – NECTEC : National Electronics and Computer Technology Center https://www.nectec.or.th/en 32 32 Design, Simulation, Characterization, and Circuit Design Research Team (DSCRT) https://www.nectec.or.th/en/research/tmec/tmec-dscrt.html Wed, 15 Jun 2022 07:18:52 +0000 https://www.nectec.or.th/en/?p=21624

Design, Simulation, Characterization, and Circuit Design Research Team (DSC) is a part of Thai Microelectronics Center (TMEC). The main activities of the research team include;

  1. Research and development of process technology and semiconductor devices such as sensors based on TMEC’s Cleanroom Facilities and Process Equipment.
  2. Research and development of integrated circuits for application as sensor interfacing circuit e.g. chemical- and bio-sensor readout IC
  3. Research and development of device model for simulation of microelectronics device
  4. Research and development of the system, equipment, and method for test and characterization of microelectronics devices and MEMS

สารบัญ

Vision 

Build and support sustainable sensor, MEMS, and semiconductor process-based industry ecosystems.

Mission 

To research and develop microelectronics devices and integrated circuits for application with advanced sensors and MEMS

Core Technology

  • Customizable CMOS Process Technology
  • Semiconductor Device Modeling and Simulation
  • Electrical Characterization (Wafer and Chip level)
  • Semi-automatic Wafer Testing Probe Station

Renown Projects

  • Power Diode Design for EV and HEV
  • Silicon Detector

Members & Expertise 

  • Mr. Wittawat Yamwong : Semiconductor Device and Process Simulation, Semiconductor Device Characterization, Silicon Process Technology (CMOS, Power Device), Electronics Circuit Analysis
  • Dr. Jirawat Prabket : Semiconductor Device Characterization, Silicon Process Technology (CMOS, Power Device, Silicon Detector)
  • Dr. Anucha Ruangphanit : Semiconductor Device and Process Simulation, Semiconductor Device Characterization, Silicon Process Technology (CMOS)
  • Dr. Apiradee Yodtean : Analog IC Design
  • Dr. Thawatchai Kamsri : Electronics Circuit Design Test and Automation Measurement 
  • Mr. Boonkue Phinyo : Pressure Sensor Testing and Characterization

Contact

Design, Simulation, Characterization, and Circuit Design Research Team (DSCRT)
Thai Microelectronics Center (TMEC)
email: wittawat.yamwong[at]nectec.or.th
Tel: +66 (0)38 857 100 ext. 140

 

]]> Surface and Microfluidic Device Innovation Research Team (SMD-1RT) https://www.nectec.or.th/en/research/tmec/tmec-smd-1rt.html Wed, 15 Jun 2022 06:50:03 +0000 https://www.nectec.or.th/en/?p=21659

The SMD-1 research team is our of three research teams of Thai Microelectronics Center (TMEC), the organization under the National Electronics and Computer Technology Center (NECTEC) and the National Science and Technology Development Agency (NSTDA), Thailand. The SMD-1 research team provides expertise in research, development, design and engineering (RDDE) of surface innovation and microfluidic, lab-on-a-chip (LOC) and lab-on-a-disc (LOD) devices fabricated by sustainable micro/nanofabrication technology. The services of material characterization and surface analysis are also provided. Additionally, the SMD-1 research team pushes forward TMEC prototypes into commercial products by collaborating with all sectors locally and internationally. The present targets are automated medical screening system with Lab-on-Disc and Large area Super-hydrophobic film for medical and undersea applications.

สารบัญ

Vision 

A key partner for research, development, design, and Engineering (RDDE) to develop surface and microfluidic device innovation that is integrated with advanced material characterization and surface analysis for commercialized industrial applications.

Mission 

To strengthen research, development, design and engineering (RDDE) and support necessary S&T human resource development (HRD) and technology transfer (TT) with global partners in order to sustainability competitive ecosystem development in Thailand and launch innovation products for global commercialization.

Core Technology

The SMD-1 research team carries out a research activity together with Silicon Industrial Fabrication Research Team (SIFRT) and Design, Simulation, Characterization, and Circuit Design Research Team (DSCRT) by sharing research facilities and utilities at TMEC. The semiconductor devices and all fabrication processes are CMOS compatible fabrication process on 6 inch silicon wafer in class 100 cleanroom.

The main research activities of SMD-1 research team can be categorized into four groups

    1. Advance lithography process
    2. Surface innovation technology platform
    3. Microfluidic technology platform
    4. Advancematerial characterizations and surface analysis

1. Advance Lithography Process

  • Photomask design and fabrication
  • Thin film deposition (SiO2, Si3N4, Poly-Si, a-Si, TEOS, SOG, Al, Ti, TiN, etc.)
  • Chemical etching and plasma etching (RIE and Deep-RIE)
  • Silicon mold and intermediate polymer mold fabrication
  • Soft lithography process (Polymer micro-structure fabrication)
  • Sub-resolution patterning (Sidewall Image Transfer (SIT) technology, Photoresist trimming process, and multiple-patterning process)
  • 3-D patterning by greyscale lithography and Multi-film thickness mask (MFT-mask)

2. Surface Innovation Technology Platform

  • Composite materials with low-surface energy
  • Slippery Liquid-Infused Porous Surfaces (SLIPS)
  • Frame treatment process (Nano-texturing)
  • Surface functionalization
  • Molecular analysis
  • Superhydrophobic and superoleophobic surface
  • Anti-bacterial and anti-fouling technologies
  • Large-area patterning (R2R and R2P) (collaboration with international partners)

3. Microfluidic technology platform

  • Microfluidic devices [Lab-on-Chip (LOC), Lab-on-Disc (LOD), Organ-on-Chip (OOC)]
  • Micro-droplet devices (cell sorting/cell trapping/cell culturing)
  • Plasma bonding and laser cutting
  • High-throughput injection molding (collaboration with international partners)

4. Advanced material characterizations and surface analysis

  • Field-emission Scanning Electron Microscope (FE-SEM) (with Energy Dispersive X-ray Spectroscopy (EDX) and X-ray Fluorescence (XRF))
  • Auger Electron Spectroscopy (AES)
  • Contact angle goniometer
  • Spectrophotometer
  • Ellipsometer
  • Film stress measurement
  • Step profilometer

Services and consults

  • Design, simulation and fabrication of micro/nanostructures by using advance lithography and soft lithography process
  • Development of superhydrophobic and superoleophobic surface on various materials
  • Design, simulation and fabrication of microfluidic devices, lab-on-a-chip (LOC), lab-on-a-disc (LOD) and Gut-on-a-chip (GOC).
  • Advanced material characterization and surface analysis by using Auger Electron Spectroscopy (AES), Field-emission Scanning Electron Microscope (FE-SEM), Energy Dispersive X-ray Spectroscopy (EDX), X-ray Fluorescence (XRF), and Contact angle goniometer
  • Tutorial courses on semiconductor technology

Renown Projects

Surface innovation technology platform

1. FleXARs Technology
Large-area flexible polymers with antifouling robust micro-structure for marine, medical, and transportation applications (FleXARs project –an everything-free surface).
2. Slippery Liquid-Infused Porous Surface (SLIPS project)
To produce a large-area antifouling surface for marine & medical applications and public transportation system.
3. High-contrast Marking Vehicle Tire
Ultra-low light reflectivity micro-structure for vehicle and optical devices

Microfluidic Technology Platform

1. Microfluidic Technology Platform
Microfluidic technology platform for cell sorting/cell trapping/cell culturing of cancer stem cell (CSC) and development of micro-droplet generator and diagnostic assay for rapid and high-throughput biological experiments
2. Lab-on-a-Disc (LOD)
Technology platforms of lab-on-a-disc (LOD) for semi-automated Microfilaria detection system (AMS) and LOD for raw milk quality monitoring system
3. Gut-on-a-Chip (GOC)
Technology platform of Gut-on-a-chip based on microfluidics technology for toxicology and pharmacokinetic study of food and pharmaceutical industries and others

Patent lists

  1. N. Atthi et.al., “Micropallette to holding micro-workpieces by using photolithography process”, Thailand patent (Granted no. 73809), January 2020.
  2. N. Atthi, et.al., “Chromium/nickel multi-film thickness mask for three-dimensional microstructure fabrication”, Thailand patent (Granted no. 64545), 2018.
  3. N. Atthi, et.al., “Photoresist 3D structures formation by varying dose technique from a single light source”, Thailand patent (Pending no. 0701001176), March 2007.
  4. N. Atthi et.al., “Multi-Film Thickness Mask, MFT-Mask”, Thailand patent (Pending no. 0701002029), April 2007.
  5. N. Atthi, et.al., “Chemical-adhesive protective gloves”, Thailand patent (Pending no. 0801003347), June 2008.
  6. N. Atthi, et.al., “Self-forming microlens by using a deflection of that film”, Thailand patent (Pending no. 0901001917), April 2009.
  7. O.Trithaveesak, et.al., “Fabrication of planar chemical reference micro-electrode”, Thailand patent (Pending no. 0901002164), May 2009.
  8. N. Atthi, et.al., “Biosensor arrays fabricated by thin film layer on silicon opaque substrate”, Thailand patent (Pending no. 0901003142), July 2009.
  9. N. Atthi, et.al., “Laminating an adhesive film on deep-trench substrate for holding it on a vacuum handling system”, Thailand patent (Pending no. 0901003316), July 2009.
  10. N. Atthi, et.al., “Increasing a surface roughness with pentagonal and octagonal micro-pattern arrays for superhydrophobic surface”, Thailand patent (Pending no. 0901003706), July 2009.
  11. J. Supadech, et.al., “Fabrication of water and oil-repellant with a high reflectivity surface by using black silicon”, Thailand patent (Pending no. 1001001270), August 2010.
  12. N. Atthi, et.al., “Method to make a photoluminescence on silicon nano-pillar”, Thailand patent (Pending no. 1001001708), November 2010.
  13. K. Saejok, et.al., “Method and process step to make a cavity for silicon surface membrane sensor”, Thailand patent (Pending no. 1101000088), April 2011.
  14. N. Atthi, et.al., “Increasing the pattern density and surface area by using trimming lithography”, Thailand patent (Pending no. 1101001717), August 2011
  15. S. Boonruang, et.al., “Sub-diffraction limited diffractive optical elements”, Thailand patent (Pending no. 1201000867), January 2012.
  16. N. Atthi, et.al., Antifouling Materials and Method of Fabrication Therefor”, Thailand patent (Pending no. 1701003836), July 2016.
  17. N. Atthi, et.al., “Anti-fouling materials with robust microstructures”, Thailand patent (Pending no. 1801005675), August 2018.
  18. N. Atthi, et.al., “Anti-fouling materials with robust guard-ring microstructures”, Thailand patent (Pending no. 1801005676), August 2018.
  19. N. Atthi, et.al., “Antifouling Robust Microstructure”, Thailand patent (Pending no. 1802004081), August 2018.
  20. N. Atthi, et.al., “Robust Microstructure with Guard Ring Pattern”, Thailand patent (Pending no. 1802004082), August 2018.
  21. P. Pattamang, et.al., “Lab-on-disc for substance separation and characterization”, Thailand patent (Pending no. 1902004384), November 2019.
  22. N. Atthi, et.al., “Antifouling Robust Microstructure on Material Surface”, Thailand petty patent (Pending no. 1903002291), September 2019.
  23. K. Saejok, et.al., “Superhydrophobic Electrical Conductivity Probe”, Thailand petty patent (Pending no. 1903002439), September 2019.

Journal publication lists (Selected)

● Surface innovation and advance lithography technologies

  1. J. Jantawong, et.al., “The study on 3-D microstructure fabrication with gray-scale lithography technique”, Ladkrabang Eng. J., 25 (2), pp. 42-46 (2007).
  2. N. Atthi, et.al., “Study of optimization condition for spin coating of the photoresist film on 3 inches wafer by Taguchi design of experiment”, Khon kaen Univ. Res. J., 13 (3), pp. 347-352 (2008).
  3. N. Atthi, et.al., “3-dimensionals lithography techniques for air bearing surface patterning in hard-disk drive reading/writing head manufacturing”, Khon kaen Univ. Res. J., 13 (3), pp. 353-359 (2008).
  4. N. Atthi, et.al., “Chemical resistant improvement of natural rubber and nitride gloves by coating with hydrophobic film”, Adv. Mater. Res., 55-57, pp. 741-744 (2008).
  5. N. Atthi, et.al., “Study of optimization condition for spin coating of the photoresist film on rectangular substrate by Taguchi design of an experiment”, Songklanakarin J. Sci. Technol., 31(3), pp. 331-335 (2009).
  6. O. Nimittrakoolchai, et.al., “Parameter optimization by using a Taguchi’s method for deposition water-repellent film”, Mineral. Met. Mater. Soc., pp. 1185-1190 (2009).
  7. N. Atthi, et.al., “An effect of viscosity of coating materials on silicon micro-patterning arrays for superhydrophobic surface”, Adv. Mater. Res., 93-94, pp. 447-450 (2010).
  8. N. Atthi, et.al., “Improvement of photoresist film coverage on high topology surface with spray coating technique”, J.Microsc. Soc. Thailand, 24 (1), pp. 42-46 (2010).
  9. N. Atthi, et.al., “An effect of silicon micro-patterning arrays on superhydrophobic surface”, J. Nanosci. Nanotechnol., 11, pp. 1-7 (2011).
  10. N. Atthi, et.al., “Fabrication of ultra-hydrophobic surface with low reflectance using black silicon nanostructures”, NECTEC Tech. J., (22), pp. 180-185 (2010).
  11. N. Chathirat, et.al., “A micro-grating sensor for DNA hybridization and antibody HSA-antigen HSA interaction experiments”, Jpn. J. Appl. Phys. 50 (1s2), p. 01BK01 (2010).
  12. N. Atthi, et.al., “Increasing active surface area to fabricate ultra-hydrophobic surface by using “Black silicon” with Bosch etching process”, J. Nanosci. Nanotechnol, 12, pp. 1-9, (2012).
  13. N. Atthi, et.al., “Effect of black silicon pillar height on water repellent and surface reflectance”, J. Microsc. Soc.Thailand, 4 (1), pp. 32-35, (2011).
  14. P. Pholprasit, et.al., “Pattern transfer characterization after double-level lithography for a fabrication of the 3-D AlTiC air bearing surface of the hard disk slider”, Jpn. J. Appl. Phys., 51 (6s), p. 06FF08 (2012).
  15. N. Atthi, et.al., “Trimming lithography: The alternative technology for sub-resolution and sub-wavelength patterning”, ECTI Trans. Electric. Eng., Electron. Commun.,10 (2), pp. 198-207 (2012).
  16. N. Siwarakrangsun, et.al., “Fabrication of Multi-level photoresist patterns in one-step lithography by using Cr/Ni Multi-film thickness mask,” Adv. Mater. Res., 658, pp. 93-96 (2013).
  17. C. Viphavakit, et.al., “Development of integrated microfluidic device for optical flow rate sensing”, J. Circuit Syst. Comp., 22, p. 1340016 (2013).
  18. C. Viphavakit, et.al., “Realization of a polymer nanowire optical transducer by using the nanoimprint technique”, Appl. Optics. 53 (30), p. 1 (2014).

● Microfluidic technology platform

  1. Phuakrod, et.al., “Diagnosis of feline filariasis assisted by a novel semi-automated microfluidic device in combination with high resolution melting real-time PCR”, Parasites & Vectors (2019).
  2. D. Ketpun , et.al., “A Potential Application of Triangular Microwells to Entrap Single Cancer Cells: A Canine Cutaneous Mast Cell Tumor Model” , Micromachines 10, 841 (2019).
  3. T. Tongmanee, et.al., “Effects of the cell and triangular microwell size on the cell-trapping efficacy and specificity”, J. Mechanical Sci. Technol. 33 (11) pp.5571-5580 (2019).
  4. T. Suwannaphan, et.al., “Investigation of Leukocyte Viability and Damage in Spiral Microchannel and Contraction-Expansion Array”, Micromachines 10, 772 (2019).
  5. D. Tantraviwat, et.al., “Highly dispersed porous polydimethylsiloxane for boosting power-generating performance of triboelectric nanogenerators”, Nano Energy (2019).
  6. P. Inpota, et.al., “Chemiluminescence detection with microfluidics for innovative in situ measurement of unbound cobalt ions in dynamic equilibrium with bound ions in binding study with polyethyleneimine and its functionalized nanoparticles”, Talanta, (2018).
  7. P. Inpota, et.al., “Microfluidic Analysis with Front-Face Fluorometric Detection for the Determination of Total Inorganic Iodine in Drinking Water”, Jpn. Soc. for Analytical Chem., (2018).
  8. D. Ketpun, et.al., “The Viability of Single Cancer Cells after Exposure to Hydrodynamic Shear Stresses in a Spiral Microchannel”, Micromachines 9(1), (2017).
  9. A. Thanormsridetchai, et.al., “Focusing and sorting of multiple-sized beads and cells using low-aspect-ratio spiral microchannels”, J. Mechanical Sci. Technol. 31, (2017).

● Biological technology

  1. P. Saengdee, et.al., “Surface modification of silicon dioxide, silicon nitride and titanium oxynitride for lactate dehydrogenase immobilization”, Biosens Bioelectron, 67, 134-138 (2015).
  2. P. Saengdee, et.al., “A silicon nitride ISFET based immunosensor for Ag85B detection of tuberculosis”, Analyst, 141(20), 5767-5775 (2016).
  3. P. Saengdee, et.al., “Optimization of 3-aminopropyltriethoxysilane functionalization on silicon nitride surface for biomolecule immobilization”, Talanta, 207, 120305 (2020).

Members & Expertise 

  • Dr. Nithi Atthi (Research Team Leader)
    (D. Eng. in Electronics and Applied Physics)Expertise: Si-based semiconductor process technology, 3D High-k/metal gate stacks, micro/nanofabrication, lithography process, materials engineering and antifouling surface
  • Mr. Witsaroot Sripumkhai (Senior Research Assistant)
    (M.Sc. in Nanotechnology)
    Expertise: Micro/nano technology, Microfluidic, Lab-on-a-chip, Lab-on-a-disc, Gut-on-a-chip, and antifouling surface
  • Miss Pattaraluck Pattamang (Research Assistant)
    (M.Sc. in Nanotechnology)
    Expertise: Micro/nano technology, Microfluidic, Lab-on-a-chip, Lab-on-a-disc, Gut-on-a-chip, and antifouling surface
  • Miss Oraphan Thongsook (Lab Assistant)
    (B.S. in Electronics)
    Advanced material characterizations (FE-SEM, EDX, XRF, AES), surface analysis (contact angle goniometer), competence of testing and calibration laboratories
  • Miss. Rattanawan Meananeatra (Senior Research Assistant)(M. Eng. in Microelectronics Engineering)
    Expertise: Si-based semiconductor process technology, micro/nanofabrication, lithography process, sensor technologies
  • Dr. Pawasuth Saengdee (Post-Doc Researcher)
    (Ph.D. in Medical Technology)
    Expertise: Surface functionalization, Material characterization, Sensor development (Electrochemical device, Quartz Crystal Microbalance (QCM)), Molecular analysis
  • Mr. Norabadee Ranron (Assistant Researcher)
    (M.S. in Mechanical and Automotive Engineering)
    Expertise: Microfluidic, Lab-on-a-chip, Lab-on-a-disc, Gut-on-a-chip
  • Miss Krynnaras Pankong (Assistant Researcher)
    (M.Eng. in Electrical Engineering)
    Expertise: Telecommunication system, MIMO system, AutoCAD, MATLAB, LabVIEW, C++
  • WARINRAMPAI UAHCHINKUL
    Expertise: Nanotechnology, Nanomaterials, FE-SEM, HPLC, AF4, DLS, UV-Vis Spectrophotometer and Contact angle goniometer

Contact

Surface and Microfluidic Device Innovation Research Team (SMD-1RT)
Thai Microelectronics Center (TMEC)
e-mail: tmec-smd@nectec.or.th
Tel.: +(66)-38-857100 ext. 124, 125, 307, 312
Website: https://tmec.nectec.or.th/home/index/lang/eng

 

]]> Silicon Industrial Fabrication Research Team (SIFRT) https://www.nectec.or.th/en/research/tmec/tmec-sifrt.html Wed, 15 Jun 2022 06:47:42 +0000 https://www.nectec.or.th/en/?p=21657

Silicon Industrial Fabrication Research team (SIFRT) is a team under Thai Microelectronics Center (TMEC), Our research team has developed both local and international research collaboration and connections with research units, academics, institutions and etc. For example, a joint research project to develop a silicon microchannel heat exchanger between TMEC-ALICE/CERN, a customization fabrication process and services of silicon mold for private companies and etc. SIFRT consists of 3 research groups as follows:

  1. Silicon Process Technology Team (SPT): A research group with knowledge, skills, expertise in CMOS-MEMS microfabrication technologies including hand-on experiences in operating various machines and tools in the cleanroom.
  2. ISFET Team (IST): A research group with knowledge, skills, expertise in Ion sensitive field effect transistor (or ISFET) technology that is used as a platform for developing chemical sensors and biosensors.
  3. MEMS Team: A Research groups with knowledge, skills, and expertise in design, simulation modeling and fabrication of various micro-devices and micro-structures using CMOS-MEMS fabrication technologies This also includes post-fabrication process such as assembly, packaging, electrical properties and functional testing, product reliability and qualification of sensors and MEMS from concept to prototype to commercial products.

สารบัญ

Vision 

To promote and support the study, research and development, technology transfer and applications related to Si CMOS-MEMS fabrication technologies of various sensors and MEMS devices including other microdevices and microstructures that pave the way to development of new technologies and innovations in the future. Aiming towards the ultimate goal is to create a concrete upstream microelectronics industry in Thailand, and to demonstrate competitive advantages.

Mission

  • Research and development of both optimal and advanced sensors, MEMS, microdevices, and microstructures onto silicon substrates using CMOS-MEMS fabrication technologies
  • Research and development of Ion sensitive field-effect transistor (or ISFET) technology as a platform of chemical sensors and biosensors
  • Enabling the ecosystem of advanced sensors and MEMS production in Thailand

Core Technology

  • CMOS-MEMS fabrication technologies for sensors, MEMS, microdevices and microstructures onto silicon substrates
  • ISFET or Ion sensitive field technology transistor is a platform for developing chemical sensor and biosensors, with ISFET surface modification that are specific to the substances needed to measure on the silicon nitride layer which is an ISFET gate dielectric. For example, development of ISFET-based sensors comprises of nitrate sensor, DNAA sensor, DNA biosensor and TB sensor.

Renown Project

  • Development of photonic array biosensor technology and ISFET-based sensors for detection of fungal toxins [2019-present]
  • The prototype “Handheld Real time ISFET based nitrate” has been awarded the Silver Medal Award from 2017 Taipei International Invention Show & Technomart Invention Contest, which is held at Taipei World Trade Center between 28-30 September 2560 in Taipei, Taiwan
  • A silicon nitride ISFET based immunosensor for Ag85B detection of tuberculosis [2016]
  • Non-enzymatic urea sensor using molecularly imprinted polymers surface modified based-on ion-sensitive field effect transistor (ISFET) [2016]
  • Prototype development of durable nitrate sensor by surface modification [2016-present]
  • Development of an immunoFET biosensor for the detection of biotinylated PCR Product [2016-present]
  • Prototype development of piezoresistive pressure sensors using the integrated CMOS-MEMS microfabrication on the silicon sub-state. The pressure rage is 0-30 bar enabling them to be potentially applied in different areas such as in agriculture, industrial, medical etc., and higher pressure range up to 50 bar for specific application in the near future. [2014-present]
  • Developed the manufacturing process of the probe for use with the pressure wire in the heart of the product, RADI Medical Systems AB, Sweden (currently merged with Saint Jude Medical in the United States) to assist in the measurement of blood pressure for patients with coronary artery disease. By developing commercial prototypes of blood pressure sensor was 120,000 dies (the 1st generation) to 400,000 dies (the 5th generation) [2004-2013]
  • Development of fabrication process for the first generation Si MEMS microphone having a diaphragm that detects sound pressures (acoustic waves), made of an epitaxially grown silicon. In the second generation, a diaphragm is constructed from a thin-film polysilicon [2015-present]
  • Development of fabrication process for the first generation of high-precision MEMS gyroscope prototype. [2019–present, in a process of developing a proposal with the start-up company]

Members & Expertise

I. Silicon Process Technology Team (SPT)

  • Mr. Jakrapong Supadech (Leader) : MEMS microphone, pressure sensor gyroscope, CMOS-MEMS process integration, plasma etching (RIE, ICP & Si DRIE)
  • Mr. Nimit Somwang : Ion-implantation, wet chemical etching
  • Miss Rattanawan Meananeatra : Photolithography, mask design, layout and tape-out
  • Mr. Arckom Srihapat : Plasma enhanced chemical vapor deposition (PECVD), 3D-printing design and modeling
  • Mr. Aekchai Chummano : Wet chemical etching, wafer cleaning

II. ISFET Team (IST)

  • Mr. Win Bunjongpru (Leader) : ISFET platform for chemical and biological applications, CMOS-MEMS process Integration, sputtering
  • Mr. Woraphan Chaisriratanakul : Polymer sensing membrane technologies
  • Mr. Awirut Srisuwan : Planar solid state reference electrode, plasma etching (RIE)
  • Mr. Apirak Pankiew : Quality control of ISFET devices, Photolithography and wet chemical etching
  • Mr. Nutthaphat Thornyanadacha : Advanced integrated circuits (ICs), sensors and MEMS packaging technologies
  • Mr. Somkiad kaewno : Sputtering
  • Miss Panyasiri tadaworawit : Plasma etching (RIE)

III. MEMS Team (MEMST)

  • Miss Hwanjit Rattanasonti (Leader) : MEMS microphone, pressure sensor, gyroscope, micro-energy harvesting devices (e.g., thermal, vibration), microfabrication ion traps, CMOS-MEMS fabrication process, device characterization and failure analysis
  • Mr. Putapon Pengpad : A CMOS-MEMS humidity sensor integrated with micro heater, a graphene-based humidity sensor for linearity improvement of sensing curves, MEMS pressure sensors, rapid thermal processing (RTP)
  • Mr. Karoon Saejok : MEMS pressure sensor, Ion-implantation
  • Mr. Ekalak Chaowicharat : MEMS microphone, pressure sensor, gyroscope, accelerometer, CMOS-MEMS fabrication process
  • Mr. Chana Leepattarapongpan : MEMS microphone, pressure sensor, magnetic sensor, wet/dry oxidation and thin-film deposition
  • Mr. Watcharapong Paosangthong : Photolithography, energy harvesting technology (*on study abroad)

Contact

Thai Microelectronics Center (TMEC)
51/4 Moo 1 Suwintawong Road, Wangtakien,
Muang, Chachoengsao 24000, THAILAND
Tel: +66 (0)38-857-100 ext. 0
Fax: +66 (0)38-857-175

]]> Thai Microelectronics Center (TMEC) https://www.nectec.or.th/en/research/tmec.html Wed, 15 Jun 2022 03:07:19 +0000 https://www.nectec.or.th/en/?p=17589

Thai Microelectronics Center (TMEC) is a research unit under National Electronics and Computer Technology Center (NECTEC). TMEC core technology is the silicon process technology focusing on silicon sensor and electronic device research and development. TMEC comprises 3 research teams of different key activities as follows:

  1. Silicon Industrial Fabrication Research Team (SIFRT) with their key roles in research and development in Micro Electro Mechanical System (MEMS), Chemical and bio-sensor platform based on Ion Sensitive Field Effect Transistor (ISFET) Technology, and wafer-level sensor prototyping and small volume production
  2. Design, Simulation, Characterization, and Circuit Design Research Team (DSCRT) basically sustains the product and innovation through research and development with the aid of simulation and characterization of new sensors and electronic devices. DSCRT also supports wafer level and chip level testing services and facilities to the other teams.
  3. Surface and Microfluidic Device Innovation Research Team (SMD-1RT) pushes forward TMEC prototypes into commercial products by collaborating with all sectors locally and internationally. The present targets are automated medical screening system with Lab on Disc and Large area Super-hydrophobic film for medical and undersea applications.

 

TMEC Service
 

Vision

Build and support sustainable sensor, MEMS, and semiconductor process based industry ecosystem.

 

Missions

  1. Research, development, and production of MEMS (by SIFRT)
  2. Research, development, and production of Bio- and Chemical sensor platform (by SIFRT)
  3. Research, development, and production of Super-hydrophobic film and microfluidic devices (by SMD-1RT)
  4. Research and development of electronics and integrated circuits related to advanced sensors and MEMS (by DSCRT)
  5. Drive TMEC prototypes into innovation products through collaborating with strategic local and international partners
  6. Build and Promote future ecosystem of advanced sensors and MEMS 

Core Technology

  1. Semiconductor process technology
  2. Si sensor fabrication technology
  3. MEMS technologies
  4. ISFET platform
  5. Device Design, Modelling, Simulation
  6. Si mold fabrication and Casting technology through Soft-lithography for surface innovation products
  7. Microfluidic devices for lab on chip and on disc
  8. Superhydrophobic and superoleophobic surface fabrication for medical and undersea applications 

Challenges and strategy

We want to build Thailand technology industry ecosystem through collaboration with all local and international partners. The value chains will be created through local SME capacity building.

  1. Pre-production of MEMS i.e. Si Microphones, Si MEMs Gyroscope and other related prototypes following TMEC roadmap and TMEC capacity (by SIFRT)
  2. ISFET based Chemical- and bio-sensor array platform for industrial use (by SIFRT)
  3. ISFET based handheld device production for agriculture, environment, and industry (by SIFRT)
  4. Microfluidic device platform for microfilaria in immigrant workers blood samples to meet the requirement of the hospital hubs for high sample volume (SMD-1RT)
  5. Large-area superhydrophobic, superoleophobic film manufacturing (SMD-1RT)
  6. Human resource development for Integrated Circuit design industry (DSCRT)

Research Teams

Contact

Thai Microelectronics Center (TMEC)
51/4 Moo 1 Suwintawong Road, Wangtakien,
Muang, Chachoengsao 24000, THAILAND
Tel: +66 (0)38-857-100 ext. 0
Fax: +66 (0)38-857-175
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